Buffered oxide etch
Supplier:
Transene
Description:
Buffered Oxide Etchant 10:1 is a reduced-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF.
Supplier:
Transene
Description:
Buffered Oxide Etchant 6:1 with surfactant is a moderate-speed etchant for oxide films. 6:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.
Catalog Number:
(89400-756)
Supplier:
KMG
Description:
Buffered oxide etchants are used to etch thin films of silicon dioxide and shape contact and via openings.
Supplier:
Transene
Description:
Buffered Oxide Etchant 6:1 is a moderate-speed etchant for oxide films. 6:1 ratio of ammonium fluoride: HF.
Supplier:
Transene
Description:
Buffered Oxide Etchant 10:1 with surfactant is a slower-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.
Catalog Number:
(76551-216)
Supplier:
Puritan Products, Inc.
Description:
Buffered oxide etch 6:1, ElectroPUR® SEMI, Semiconductor grade, Puritan Products™
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