Bis(p-tolyl)phosphine+oxide
Catalog Number:
(TCD3219-5G)
Supplier:
TCI America
Description:
CAS Number: 2587-00-0
Molecular Formula: C5H3Cl2NO Molecular Weight: 163.99 Purity/Analysis Method: >98.0% (GC) Form: Crystal Melting point (°C): 138
Supplier:
Thermo Scientific Chemicals
Description:
MDL: MFCD00036279
Notes: For vacuum deposition
Supplier:
Enzo Life Sciences
Description:
Spin trapping reagent.
Supplier:
AMBEED, INC
Description:
Dimesitylphosphine oxide, Purity: 97%, CAS Number: 23897-16-7, Appearance: Solid, Storage: Inert atmosphere, 2-8C, Size: 1G
Supplier:
Strem Chemicals Inc
Description:
CAS #: 1309-48-4. Size: 25g.
Supplier:
BeanTown Chemical
Description:
CAS: 70187-32-5; EC No: 231-391-8; MDL No: MFCD00149388
Crystalline/Powder; Molecular Formula: C5H11NO2·H2O; MW: 135.16
Melting Point: 71-75°
Hygroscopic
Supplier:
Thermo Scientific Chemicals
Description:
Semiconductor industry for the manufacture of resistor pastes
Supplier:
THERMO FISHER SCIENTIFIC CHEMICALS
Description:
Magnesium oxide 98%, powder Ø 99% <150 µm (-100 mesh), Extra Pure
Supplier:
BeanTown Chemical
Description:
CAS: 12060-58-1; EC No: 235-043-6; MDL No: MFCD00011237
Powder; Linear Formula: Sm2O3; MW: 348.72
Melting Point: 2325°
Density (g/mL): 8.35; Refractive Index: 1.97
Supplier:
Honeywell Research Chemicals
Description:
Titanium(IV) oxide, Purity: 99-100.5%, Grade: Puriss, Cas no: 13463-67-7, Molecular Formula: TiO2, Molar mass: 79.87 g/mol, Quality: Meets analytical specification of BP, Ph. Eur, USP, Synonym: Titania, Titanium dioxide, Laboratory Chemical, Reagent Grade Salt, Size: 250G
Supplier:
TCI America
Description:
CAS Number: 30608-62-9
MDL Number: MFCD02683445 Molecular Formula: C4H8O Molecular Weight: 72.11 Purity/Analysis Method: >98.0% (GC) Form: Clear Liquid Boiling point (°C): 63 Flash Point (°C): -22 Specific Gravity (20/20): 0.84 Specific rotation [a]20/D: -10 deg (neat)
Catalog Number:
(100497-268)
Supplier:
Electron Microscopy Sciences
Description:
These suspensions are water-based and contain no additives, which may interfere with polishing or contaminate the sample. All slurries are very stable and alumina is evenly dispersed. Excellent for the finest finishes.
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