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Reagent+semiconductor+etchant
Supplier:
Transene
Description:
RSE-100 is a nitric/HF/acetic formulation for controlled anisotropic etching of amorphouse or crystalline silicon.
Catalog Number:
(BJ40207H-2.5L)
Supplier:
Honeywell Research Chemicals
Description:
We are your supplier of high-quality lab reagents and chemicals for analytical and chemistry laboratories:
Supplier:
Transene
Description:
Palladium Etchant TFP is a non-cyanide formulation for controlled etching of palladium films.
Supplier:
Transene
Description:
Chromium Etchant 1020 is an excellent general purpose etchant for chrome thin films or photomasks.
Supplier:
Transene
Description:
Wright Etchant is the classic defect delineation etchant for silicon semiconductor substrates.
Supplier:
Transene
Description:
Copper Etchant APS-100 is an ammonium persulfate solution with excellent control for fine-line etching of copper films in integrated circuits.
Supplier:
Transene
Description:
Chromium Etchant 1020AC is a slower etchant for chrome thin films or photomasks. Slower etch rate provides better control, enhanced fine-line definition, and compatibility with a broader range of materials and photoresists.
Supplier:
Transene
Description:
Titanium Etchant TFTN is HF-free with a slow etch rate for fine line etching of titanium films. Will not attack glass/oxide.
Catalog Number:
(10803-036)
Supplier:
KMG
Description:
CR-16, is a nitric acid based chrome etchant used for photolithography masks, semiconductor and MEMS processes. It is designed to provide minimum undercutting, maximum critical dimension control and repeatability.
Supplier:
Thermo Scientific Chemicals
Description:
Applications: High purity, low sodium and 0.2 micron filtration system for semiconductor and microelectronic applications
Supplier:
Transene
Description:
Titanium Etchant TFT is a general purpose titanium etchant with a controlled etch rate.
Supplier:
Transene
Description:
Tantalum Etchant 111 provides controlled etching of tantalum, tantalum oxide, and tantalum nitride materials.
Supplier:
Transene
Description:
Buffered Oxide Etchant 6:1 with surfactant is a moderate-speed etchant for oxide films. 6:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.
Supplier:
Transene
Description:
Nickel Etchant TFB is an effective general purpose etchant for sputtered or evaporated pure nickel films.
Supplier:
Transene
Description:
Nichrome Etchant TFN is an effective etchant for Ni-Cr thin films in integrated circuits. Good photoresist compatibilty.
Supplier:
Transene
Description:
Gold Etchant GE-8148 is a faster gold etchant designed to minimize attack on nickel. Excellent photoresist compatibility.
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 is still displayed and you need assistance, please call us at 1-800-932-5000.
Stock for this item is limited, but may be available in a warehouse close to you. Please make sure that you are logged in to the site so that available stock can be displayed. If the
is still displayed and you need assistance, please call us at 1-800-932-5000.
This product is marked as restricted and can only be purchased by approved Shipping Accounts. If you need further assistance, email VWR Regulatory Department at Regulatory_Affairs@vwr.com
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The original product is no longer available. The replacement shown is available.
This product is no longer available. Alternatives may be available by searching with the VWR Catalog Number listed above. If you need further assistance, please call VWR Customer Service at 1-800-932-5000.
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