AHSI SPA
Supplier:
Transene
Description:
NMP is suitable for a broad range of photoresist stripping applications.
Supplier:
Transene
Description:
Buffered Oxide Etchant 10:1 is a reduced-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF.
Supplier:
Transene
Description:
Transene Sulfuric Acid LM is a "low metals" solution suitable for demanding semiconductor and electronics processing.
Supplier:
Transene
Description:
Transene Hydrochloric Acid LM is a "low metals" HCl solution suitable for demanding semiconductor and electronics processing.
Supplier:
Transene
Description:
Transene Nitric Acid LM is a "low metals" nitric acid solution suitable for demanding semiconductor and electronics processing.
Supplier:
Transene
Description:
Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.
Supplier:
Transene
Description:
Gold Etchant GE-8148 is a faster gold etchant designed to minimize attack on nickel. Excellent photoresist compatibility.
Supplier:
Transene
Description:
Copper Etchant APS-100 is an ammonium persulfate solution with excellent control for fine-line etching of copper films in integrated circuits.
Supplier:
Transene
Description:
Transene Xylenes solvent is a "low metals" chemical suitable for demanding semiconeuctor and elecrtronics processing.
Supplier:
Transene
Description:
Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.
Supplier:
Transene
Description:
Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.
Supplier:
Transene
Description:
Nichrome Etchant TFN is an effective etchant for Ni-Cr thin films in integrated circuits. Good photoresist compatibilty.
Supplier:
Transene
Description:
Wright Etchant is the classic defect delineation etchant for silicon semiconductor substrates.
Supplier:
Transene
Description:
Nickel Etchant TFB is an effective general purpose etchant for sputtered or evaporated pure nickel films.
Catalog Number:
(76540-920)
Supplier:
Transene
Description:
TRANSIST ND560 Negative Photoresist Kit is a collection of photolithography chemicals for high-resolution photopatterning for integrated circuit manufacture. The kit includes 1 pint of ND560 resist, 1 pint of thinner, 1 quart of rinse, 1 u
Supplier:
Transene
Description:
Buffered Oxide Etchant 10:1 with surfactant is a slower-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.
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This product is marked as restricted and can only be purchased by approved Shipping Accounts. If you need further assistance, email VWR Regulatory Department at Regulatory_Affairs@vwr.com
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The original product is no longer available. The replacement shown is available.
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