Supplier >
AHSI SPA
Print…
You Searched For:
371 results were found
AHSI SPA
Supplier:
Transene
Description:
NMP is suitable for a broad range of photoresist stripping applications.
Supplier:
Transene
Description:
Buffered Oxide Etchant 10:1 is a reduced-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF.
Supplier:
Transene
Description:
Transene Hydrochloric Acid LM is a "low metals" HCl solution suitable for demanding semiconductor and electronics processing.
Supplier:
Transene
Description:
Transene Nitric Acid LM is a "low metals" nitric acid solution suitable for demanding semiconductor and electronics processing.
Supplier:
Transene
Description:
Transene Sulfuric Acid LM is a "low metals" solution suitable for demanding semiconductor and electronics processing.
Supplier:
Transene
Description:
Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.
Supplier:
Transene
Description:
Gold Etchant GE-8148 is a faster gold etchant designed to minimize attack on nickel. Excellent photoresist compatibility.
Supplier:
Transene
Description:
Copper Etchant APS-100 is an ammonium persulfate solution with excellent control for fine-line etching of copper films in integrated circuits.
Supplier:
Transene
Description:
Transene Xylenes solvent is a "low metals" chemical suitable for demanding semiconeuctor and elecrtronics processing.
Supplier:
Transene
Description:
Buffered Oxide Etchant 10:1 with surfactant is a slower-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.
Supplier:
Transene
Description:
Titanium Etchant TFTN is HF-free with a slow etch rate for fine line etching of titanium films. Will not attack glass/oxide.
Supplier:
Transene
Description:
Chromium Etchant 1020 is an excellent general purpose etchant for chrome thin films or photomasks.
Supplier:
Transene
Description:
Transene Hydrofluoric Acid LM is a "low metals" HF solution suitable for demanding semiconductor and electronics processing. Fast removal of oxides and nitrides.
Supplier:
Transene
Description:
Palladium Etchant TFP is a non-cyanide formulation for controlled etching of palladium films.
Supplier:
Transene
Description:
ITO Etchant TE-100 is an effective etchant for indium tin oxide films. Will not harm glass substrates.
Supplier:
Transene
Description:
Transene Isopropyl Alcohol LM (synonyms include IPA, 2-propanol, and isopropanol) is a "low metals" alcohol suitable for demanding semiconductor and electronics processing. Effective for cleaning, degreasing, and other applications. Low water content.
Inquire for Price
Stock for this item is limited, but may be available in a warehouse close to you. Please make sure that you are logged in to the site so that available stock can be displayed. If the
 is still displayed and you need assistance, please call us at 1-800-932-5000.
Stock for this item is limited, but may be available in a warehouse close to you. Please make sure that you are logged in to the site so that available stock can be displayed. If the
is still displayed and you need assistance, please call us at 1-800-932-5000.
This product is marked as restricted and can only be purchased by approved Shipping Accounts. If you need further assistance, email VWR Regulatory Department at Regulatory_Affairs@vwr.com
-Additional Documentation May be needed to purchase this item. A VWR representative will contact you if needed.
This product has been blocked by your organization. Please contact your purchasing department for more information.
The original product is no longer available. The replacement shown is available.
This product is no longer available. Alternatives may be available by searching with the VWR Catalog Number listed above. If you need further assistance, please call VWR Customer Service at 1-800-932-5000.
|
|||||||||
List View
