AHSI SPA
Supplier:
Transene
Description:
NMP is suitable for a broad range of photoresist stripping applications.
Supplier:
Transene
Description:
Buffered Oxide Etchant 10:1 is a reduced-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF.
Supplier:
Transene
Description:
Transene Hydrochloric Acid LM is a "low metals" HCl solution suitable for demanding semiconductor and electronics processing.
Supplier:
Transene
Description:
Transene Nitric Acid LM is a "low metals" nitric acid solution suitable for demanding semiconductor and electronics processing.
Supplier:
Transene
Description:
Transene Sulfuric Acid LM is a "low metals" solution suitable for demanding semiconductor and electronics processing.
Supplier:
Transene
Description:
Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.
Supplier:
Transene
Description:
Gold Etchant GE-8148 is a faster gold etchant designed to minimize attack on nickel. Excellent photoresist compatibility.
Supplier:
Transene
Description:
Copper Etchant APS-100 is an ammonium persulfate solution with excellent control for fine-line etching of copper films in integrated circuits.
Supplier:
Transene
Description:
Transene Xylenes solvent is a "low metals" chemical suitable for demanding semiconeuctor and elecrtronics processing.
Supplier:
Transene
Description:
Buffered Oxide Etchant 10:1 with surfactant is a slower-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.
Supplier:
Transene
Description:
Titanium Etchant TFTN is HF-free with a slow etch rate for fine line etching of titanium films. Will not attack glass/oxide.
Supplier:
Transene
Description:
Chromium Etchant 1020 is an excellent general purpose etchant for chrome thin films or photomasks.
Supplier:
Transene
Description:
Transene Hydrofluoric Acid LM is a "low metals" HF solution suitable for demanding semiconductor and electronics processing. Fast removal of oxides and nitrides.
Supplier:
Transene
Description:
Palladium Etchant TFP is a non-cyanide formulation for controlled etching of palladium films.
Supplier:
Transene
Description:
ITO Etchant TE-100 is an effective etchant for indium tin oxide films. Will not harm glass substrates.
Supplier:
Transene
Description:
Transene Isopropyl Alcohol LM (synonyms include IPA, 2-propanol, and isopropanol) is a "low metals" alcohol suitable for demanding semiconductor and electronics processing. Effective for cleaning, degreasing, and other applications. Low water content.
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