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AHSI SPA
Supplier:
Transene
Description:
Transene Hydrochloric Acid LM is a "low metals" HCl solution suitable for demanding semiconductor and electronics processing.
Supplier:
Transene
Description:
Transene Nitric Acid LM is a "low metals" nitric acid solution suitable for demanding semiconductor and electronics processing.
Supplier:
Transene
Description:
Transene Sulfuric Acid LM is a "low metals" solution suitable for demanding semiconductor and electronics processing.
Supplier:
Transene
Description:
Buffered Oxide Etchant 10:1 is a reduced-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF.
Supplier:
Transene
Description:
NMP is suitable for a broad range of photoresist stripping applications.
Supplier:
Transene
Description:
Titanium Etchant TFTN is HF-free with a slow etch rate for fine line etching of titanium films. Will not attack glass/oxide.
Supplier:
Transene
Description:
Palladium Etchant TFP is a non-cyanide formulation for controlled etching of palladium films.
Supplier:
Transene
Description:
Chromium Etchant 1020 is an excellent general purpose etchant for chrome thin films or photomasks.
Supplier:
Transene
Description:
Buffered Oxide Etchant 10:1 with surfactant is a slower-speed etchant for oxide films. 10:1 ratio of ammonium fluoride: HF. Contains non-PFAS surfactant to improve wet-out of high surface energy substrates or penetration of critical geometries.
Supplier:
Transene
Description:
Transene Hydrofluoric Acid LM is a "low metals" HF solution suitable for demanding semiconductor and electronics processing. Fast removal of oxides and nitrides.
Supplier:
Transene
Description:
Transene Hexamethyldisilzane LM (HMDS) is an ultra-high purity, "low metals" adhesion promoter for photoresists and other photolithography applications.
Supplier:
Transene
Description:
Copper Etchant 49-1 is a highly selective, moderate etch rate copper etchant. Will not attack photoresist or other metals, including nickel.
Supplier:
Transene
Description:
Silver Etchant TFS is a fast etchant for silver films. Excellent photoresist compatibility.
Supplier:
Transene
Description:
Copper Etchant CE-100 is a fast etch for removal of thicker copper films.
Supplier:
Transene
Description:
Buffered Oxide Etchant 6:1 is a moderate-speed etchant for oxide films. 6:1 ratio of ammonium fluoride: HF.
Supplier:
Transene
Description:
Aluminum Etchant Type A is a traditional PAN etch for effective etching of aluminum films on silicon substrates. May also be used to etch alumina. Contains surfactant. Good photoresist compatibility.
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Stock for this item is limited, but may be available in a warehouse close to you. Please make sure that you are logged in to the site so that available stock can be displayed. If the
 is still displayed and you need assistance, please call us at 1-800-932-5000.
Stock for this item is limited, but may be available in a warehouse close to you. Please make sure that you are logged in to the site so that available stock can be displayed. If the
is still displayed and you need assistance, please call us at 1-800-932-5000.
This product is marked as restricted and can only be purchased by approved Shipping Accounts. If you need further assistance, email VWR Regulatory Department at Regulatory_Affairs@vwr.com
-Additional Documentation May be needed to purchase this item. A VWR representative will contact you if needed.
This product has been blocked by your organization. Please contact your purchasing department for more information.
The original product is no longer available. The replacement shown is available.
This product is no longer available. Alternatives may be available by searching with the VWR Catalog Number listed above. If you need further assistance, please call VWR Customer Service at 1-800-932-5000.
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